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Room-temperature relaxor ferroelectricity and photovoltaic effects in SnTiOx/Si thin film heterostructures

机译:室温弛豫铁电和光伏效应   snTiOx / si薄膜异质结构

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摘要

We have studied ferroelectricity and photovoltaic effects in atomic layerdeposited (ALD) 40-nm thick SnTiO$_{x}$ films deposited directly onto p-type(001)Si substrate. These films showed well-saturated, square and repeatablehysteresis loops with remnant polarization of 1.5 $\mu$C/cm$^{2}$ at roomtemperature, as detected by out-of-plane polarization versus electric field(P-E) and field cycling measurements. A photo-induced enhancement inferroelectricity was also observed as the spontaneous polarization increasedunder white-light illumination. The ferroelectricity exhibits relaxorcharacteristics with dielectric peak shifting from ca. T = 600 K at f = 1 MHzto ca. 500 K at 100 Hz. Moreover, our films showed ferroelectric photovoltaicbehavior under the illumination of a wide spectrum of light, from visible toultraviolet regions. A combination of experiment and theoretical calculationprovided optical band gap of SnTiO$_{x}$ films which lies in the visible rangeof white light spectra. Our study leads a way to develop green ferroelectricSnTiO$_{x}$ thin films, which are compatible to semiconducting processes, andcan be used for various ferroelectric and dielectric applications.
机译:我们已经研究了直接沉积在p型(001)Si衬底上的原子层沉积(ALD)40纳米厚SnTiO $ _ {x} $膜中的铁电和光伏效应。这些薄膜显示出饱和的,方形的和可重复的磁滞回线,在室温下残留极化为1.5μm/ C / cm $ ^ {2} $,这是通过面外极化对电场(PE)和场循环来检测的测量。随着白光照射下自发极化的增加,还观察到光诱导的增强铁电性。铁电表现出弛豫特性,介电峰从ca. T = 600 K在f = 1 MHz至100 Hz时为500K。此外,我们的薄膜在可见的紫外线区域中,在宽光谱光的照射下显示出铁电光伏行为。实验与理论计算相结合,提供了在可见光谱范围内的SnTiO $ _ {x} $薄膜的光学带隙。我们的研究提出了一种开发绿色铁电体SnTiO $ _ {x} $薄膜的方法,该薄膜可与半导体工艺兼容,并可用于各种铁电体和介电应用。

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